发明名称 Semiconductor device including schottky barrier diode and method of manufacturing the same
摘要 A semiconductor device includes a substrate, a plurality of first columns having a first conductivity type, a plurality of second columns having a second conductivity type, a first electrode, and a second electrode. The first columns and the second columns are alternately arranged on the substrate to provide a super junction structure. The first electrode is disposed on the super junction structure, forms schottky junctions with the first columns, and forms ohmic junctions with the second columns. The second electrode is disposed on the substrate on an opposite side of the super junction structure. At least a part of the substrate and the super junction structure has lattice defects to provide a lifetime control region at which a lifetime of a minority carrier is controlled to be short.
申请公布号 US7968953(B2) 申请公布日期 2011.06.28
申请号 US20080078369 申请日期 2008.03.31
申请人 DENSO CORPORATION 发明人 SAKAKIBARA JUN;YAMAGUCHI HITOSHI
分类号 H01L27/06 主分类号 H01L27/06
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