发明名称 ARC MONITOR SYSTEM
摘要 To obtain an arc monitor system in which reliability of arc detection is increased by locating an arc based on optimal frames from a frame obtained before an arc discharge to a frame obtained immediately after the arc discharge. The are monitor system used to locate a occurred place of an arc discharge occurred in an electric facility, includes multiple monitor cameras 1, 5 which are arranged at multiple places in the electric facility, an image processing device 2 which processes images received from the respective monitor cameras 1, 5, a control logic section 3 which controls the image processing device 2, and an operation device 4 which includes a display section and an operation section and is connected to the control logic section 3. The image processing device 2 and the control logic section 3 extract a change in the images received from the monitor cameras 1, 5 in response to a control signal 10 generated from the electric facility on a occurrence of the arc discharge, and then locate a occurred place of the arc discharge.
申请公布号 CA2540106(C) 申请公布日期 2011.06.28
申请号 CA20042540106 申请日期 2004.09.22
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA;CHUBU ELECTRIC POWER CO., INC. 发明人 OGUCHI, YOSHIHISA;SHIMBO, KENICHI;SUZUKI, ATSUSHI;KUMAI, TOSHIYA;SAITOU, HISAYA
分类号 G01R31/08;G01M99/00;G01R31/12;G06T1/00;G06T7/00;G06T7/20;H02B3/00;H02G1/02;H04N7/18 主分类号 G01R31/08
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