发明名称 CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of reducing an effect on resolution by vibration. SOLUTION: The charged particle beam device includes: a pedestal 8: a support plate 10 supported on the pedestal 8 via a damper 7; and a supported element 30 which is supported by the support plate 10 and at least includes a charged particle gun portion 1 to generate charged particle beam and a sample holder 11 to retain a sample to irradiate the charged particle beam. In the charged particle beam device, a rotation primary center Z1 in which a vibrating body composed of the support plate 10 and the supported element 30 is below its gravity G and a rotation secondary center Z2 which is above the rotation primary center Z1. The rotation secondary center Z2 of a vibrating body 100 is housed in a region in which a sample position can be adjusted by the sample holder 11. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011124145(A) 申请公布日期 2011.06.23
申请号 JP20090281882 申请日期 2009.12.11
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ISHII RYOICHI;TANAKA HIROYUKI
分类号 H01J37/20;H01J37/16 主分类号 H01J37/20
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