发明名称 IMPRINT LITHOGRAPHY
摘要 An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.
申请公布号 WO2011072897(A1) 申请公布日期 2011.06.23
申请号 WO2010EP64663 申请日期 2010.10.01
申请人 ASML NETHERLANDS B.V.;WUISTER, SANDER;DEN BOEF, ARIE;KRUIJT-STEGEMAN, YVONNE 发明人 WUISTER, SANDER;DEN BOEF, ARIE;KRUIJT-STEGEMAN, YVONNE
分类号 G03F7/00;G03F9/00 主分类号 G03F7/00
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