IMAGING OPTICS

摘要

An imaging optics (16) for lithographic projection exposure for guiding a bundle of imaging light (3) with a wavelength shorter than 193 nm by means of a plurality of mirrors (M1 to M6) for beam-splitter-free imaging of a reflective object (12) in an object field (4) in an object plane (5) into an image field (17) in an image plane (18), an object field point having a central ray angle (a) which is smaller than 3°. At least one of the mirrors (M1 to M6) is a near-field mirror. The result is an imaging optics which allows for high-quality imaging of a reflective object.