发明名称 PATTERNED ELECTRET STRUCTURES AND METHODS FOR MANUFACTURING PATTERNED ELECTRET STRUCTURES
摘要 <p>A patterned electret structure (21) on a substrate (10) comprises a dielectric structure comprising at least one non-patterned dielectric layer (22), and a charge pattern (14) in the dielectric structure and/or at a surface of a dielectric layer that is part of the dielectric structure and/or at an interface between dielectric layers that are part of the dielectric structure. By the presence of the non-patterned dielectric layer (22), the influence of the presence of a conductive substrate (10) on the charges (14) of the electret structure (21) is alleviated, hence increasing the charge stability over time. Moreover, in embodiments of the present invention, the charge stability is substantially independent of the width (W1, W2, W3) of the charge pattern. A method for manufacturing such patterned electret structure (21) is also provided.</p>
申请公布号 EP2335258(A1) 申请公布日期 2011.06.22
申请号 EP20090782931 申请日期 2009.09.11
申请人 IMEC 发明人 LEONOV, VLADIMIR
分类号 H01G7/02;H04R19/01 主分类号 H01G7/02
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