发明名称 METHOD OF INSPECTING A MASK AND APPARATUS FOR PERFORMING THE SAME
摘要 PURPOSE: A method of inspecting a mask and an apparatus for performing the same are provided to improve the reliability of detecting the failure of a mask by detecting a failure such as a bridge and a shift due to the obtained histogram from an image. CONSTITUTION: An image of a pattern is formed on a mask is obtained(ST210). The image is smoothened(ST220). The smoothened image is processed with binarization(ST230). A histogram is obtained according to the gray level of the image(ST240). The histogram is compared with pattern information to detect the fault of a mask(ST250).
申请公布号 KR20110068401(A) 申请公布日期 2011.06.22
申请号 KR20090125341 申请日期 2009.12.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OH, YOON NA;SHIN, JAE PIL;CHOI, JIN;YOO, MOON HYUN;LEE, JONG BAE
分类号 H01L21/66 主分类号 H01L21/66
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