METHOD OF INSPECTING A MASK AND APPARATUS FOR PERFORMING THE SAME
摘要
PURPOSE: A method of inspecting a mask and an apparatus for performing the same are provided to improve the reliability of detecting the failure of a mask by detecting a failure such as a bridge and a shift due to the obtained histogram from an image. CONSTITUTION: An image of a pattern is formed on a mask is obtained(ST210). The image is smoothened(ST220). The smoothened image is processed with binarization(ST230). A histogram is obtained according to the gray level of the image(ST240). The histogram is compared with pattern information to detect the fault of a mask(ST250).
申请公布号
KR20110068401(A)
申请公布日期
2011.06.22
申请号
KR20090125341
申请日期
2009.12.16
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
OH, YOON NA;SHIN, JAE PIL;CHOI, JIN;YOO, MOON HYUN;LEE, JONG BAE