发明名称 PHOTOSENSITIVE COMPOSITION AND SOLDER RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition, capable of obtaining a resist film which is less likely to have discoloration, such as yellowing, even when exposed to a high temperature of about 200&deg;C or higher, at solder reflow. <P>SOLUTION: The photosensitive composition includes at least one of a polymerizable hydrocarbon monomer (A) and a polymerizable hydrocarbon polymer (B) and an inorganic filler (C), wherein the inorganic filler (C) shows pH 6.8-11, when a liquid prepared by adding 5 g of the inorganic filler (C) to 100 mL of pure water is heated, boiled for 5 min and allowed to stand, until it achieves 23&deg;C, to obtain a boiling treated liquid; water is added to the boiling treated liquid in an amount of water evaporated by the boiling; and the pH of the resulting liquid containing 100 mL of water is measured. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011118400(A) 申请公布日期 2011.06.16
申请号 JP20100276530 申请日期 2010.12.13
申请人 SEKISUI CHEM CO LTD 发明人 NAKAMURA HIDE;NISHIMURA TAKASHI;SHIKAGE TAKASHI;WATANABE TAKASHI
分类号 G03F7/004;C08F2/44;C08F290/12;C08G59/20;G03F7/038;H01L21/027;H05K3/28 主分类号 G03F7/004
代理机构 代理人
主权项
地址