发明名称 Method of reducing contamination by providing a removable polymer protection film during microstructure processing
摘要 By providing a protective layer in an intermediate manufacturing stage, an increased surface protection with respect to particle contamination and surface corrosion may be achieved. In some illustrative embodiments, the protective layer may be used during an electrical test procedure, in which respective contact portions are contacted through the protective layer, thereby significantly reducing particle contamination during a respective measurement process.
申请公布号 US7955962(B2) 申请公布日期 2011.06.07
申请号 US20070695657 申请日期 2007.04.03
申请人 GLOBALFOUNDRIES INC. 发明人 RICHTER RALF;FEUSTEL FRANK;WERNER THOMAS;FROHBERG KAI
分类号 H01L21/20 主分类号 H01L21/20
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