发明名称 Donor substrate and method of manufacturing display
摘要 The present invention provides a donor substrate used in forming a light emitting layer by forming a transfer layer containing light emission material, irradiating a radiation ray to the transfer layer while the transfer layer and a substrate to be transferred face each other, and sublimating or vaporizing the transfer layer so that the transfer layer is transferred to the substrate to be transferred. The donor substrate includes: a base; a photothermal conversion layer arranged on the base; and a heat interfering layer arranged between the base and the photothermal conversion layer, and including two or more layers with refraction index different from each other.
申请公布号 US7956008(B2) 申请公布日期 2011.06.07
申请号 US20090489640 申请日期 2009.06.23
申请人 SONY CORPORATION 发明人 HIGO TOMOYUKI;MATSUO KEISUKE
分类号 B41M5/035;B41M5/46;B41M5/50 主分类号 B41M5/035
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