BRUSH ROLL FOR SEMICONDUCTOR WAFER

摘要

The present invention relates to a PVA brush roll for use in a CMP process (wafer cleaning process) for fabricating semiconductors, wherein said PVA brush roll comprises: a rotatable core; a brush arranged on the outer surface of the core, and having a surface with a plurality of protrusions; and a support member which is inserted into the brush so as to support the brush, and one side of which protrudes from the brush and is coupled to the core, thereby preventing the brush from being twisted or leaning to one side, and fitting and coupling the brush to the core in a convenient and firm manner.