ULTRASONIC WAVEGUIDE DEVICE SUITABLE FOR USE IN A DIRECTIONAL SOLIDIFICATION FURNACE FOR SILICON

摘要

The invention relates to an ultrasonic waveguide device (1) suitable for use in a silicon crystallization furnace and intended to be partially inserted into the crystallization chamber of said furnace through an opening provided in the wall of the chamber. Said device includes: a waveguide (2) made of crystalline silica, including a wave entry surface (11), a wave exit surface (12) and a lateral surface (10) connecting the entry surface and the exit surface; a structure (3) made of graphite or silicon carbide, which at least partly surrounds the lateral surface of the waveguide; an intermediate powder layer (4) made of silicon nitride or silicon carbide, which covers at least those parts of the lateral surface of the waveguide that are surrounded by the structure (3).