Manufacturig method of floating gate layer for semiconductor device,申请号KR20080047042-传众专利搜索

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发明名称	Manufacturig method of floating gate layer for semiconductor device
摘要
申请公布号	KR101038398(B1)	申请公布日期	2011.06.01
申请号	KR20080047042	申请日期	2008.05.21
申请人		发明人
分类号	H01L21/8247;H01L27/115	主分类号	H01L21/8247
代理机构		代理人
主权项
地址

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