| 摘要 |
PURPOSE: A plasma processing apparatus for improving reproducibility and reliability is provided to enhance a hight frequency cutoff function by controlling a parallel resonance frequency arbitrarily. CONSTITUTION: A filter(102(1)) accepts coaxially a coil(104(1)) within a cylindrical outer conductor(110). A ring member(122) is installed between the coil and the outer conductor coaxially. The ring member comprises a plate extended as an annular shape on a plane in perpendicular to the axial direction of the outer conductor. The ring member is made of copper, aluminum etc. The ring member is electrically connected to the outer conductor. The ring member is electrically insulated from the coil. |
