发明名称 SULFONIUM SALT, PHOTO ACID-GENERATING AGENT, CURABLE COMPOSITION AND POSITIVE PHOTORESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a sulfonium salt that exhibits high photosensitivity to i-line and is excellent in compatibility with a polymerizable compound and storage stability after compounded, and an acid-generating agent comprising the same. <P>SOLUTION: The photo acid-generating agent includes a sulfonium salt represented by formula (1) or a mixed sulfonium salt represented by formulae (1) and (2). In the formulae, R<SP>1</SP>-R<SP>6</SP>and R<SP>'1</SP>-R<SP>'9</SP>are each an alkyl group, an alkoxy group or the like; Ar<SP>1</SP>-Ar<SP>5</SP>are each a phenyl group, a naphthyl group, a phenylene group or a naphthylene group; m<SP>1</SP>-m<SP>6</SP>and n<SP>1</SP>-n<SP>9</SP>are each number of the groups; and X<SP>-</SP>is a monovalent polyatomic anion. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011102269(A) 申请公布日期 2011.05.26
申请号 JP20090257930 申请日期 2009.11.11
申请人 SAN APRO KK 发明人 KIMURA HIDEKI;SUZUKI KAZUO
分类号 C07C381/12;C08L101/00;C09K3/00;G03F7/004;G03F7/039 主分类号 C07C381/12
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