发明名称 Analysis by photo acoustic displacement and interferometryl
摘要 A device for analyzing a material, the device having a photo acoustic generator (40) for generating pressure waves in the material by pulsed illumination by a light source, and a sensor (20, 30, 50) for producing a signal using self mixing interferometry, the signal representing displacements of the material due to the pressure waves, and a signal processor (60) for processing the signal to analyze the material. This combination of photo acoustic stimulation and self mixing interferometry sensing helps reduce or avoid errors or distortions caused by sensor contact on the material, and can provide a better ratio of sensitivity for a given degree of compactness of the device.
申请公布号 US2011125004(A1) 申请公布日期 2011.05.26
申请号 US200913055531 申请日期 2009.07.24
申请人 KONINKLIKJKE PHILIPS ELECTRONICS N.V. 发明人 THUMMA KIRAN KUMAR;MOESKOPS BASTIAAN WILHELMUS MARIA;VON BASUM GOLO;LIU YAN
分类号 A61B5/05 主分类号 A61B5/05
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