发明名称 |
APPARATUS FOR PROCESSING SUBSTRATE |
摘要 |
An apparatus for processing a substrate includes: a process chamber providing a reaction space by a combination of a lid and a body; a susceptor in the reaction space and having a substrate thereon; a plurality of plasma source electrodes over the reaction space; a plurality of first lower protruding portions under the lid; and a plurality of first gas injecting means corresponding to the plurality of plasma source electrodes and a plurality of second gas injecting means alternately disposed with the plurality of first gas injecting means.
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申请公布号 |
US2011120375(A1) |
申请公布日期 |
2011.05.26 |
申请号 |
US20100950928 |
申请日期 |
2010.11.19 |
申请人 |
JUSUNG ENGINEERING CO., LTD. |
发明人 |
SONG MYUNG-GON;LEE JUNG-RAK;DO JAE-CHUL;JEON BU-IL |
分类号 |
C23C16/453 |
主分类号 |
C23C16/453 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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