发明名称 |
CLOSED LOOP CONTROL OF PAD PROFILE BASED ON METROLOGY FEEDBACK |
摘要 |
A chemical mechanical polishing apparatus includes a metrology system that detects the thickness of the polishing pad as semiconductor wafers are processed and the thickness of the polishing pad is reduced. The chemical mechanical polishing apparatus includes a controller that adjusts the rate of material removal of a conditioning disk when areas of the polishing surface are detected that are higher or lower than the adjacent areas of the polishing pad. |
申请公布号 |
KR20110055602(A) |
申请公布日期 |
2011.05.25 |
申请号 |
KR20117005360 |
申请日期 |
2009.08.03 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
CHANG SHOU SUNG;CHEN HUNG CHIH;TSAI STAN D.;WANG YUCHUN |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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