ETHING NOZZLE DEVICE AND ETHING APPARATUS USING THE SAME

摘要

PURPOSE: An etching nozzle device and an etching device using the same are provided to control the spray uniformity and spray pressure of an etching nozzle by vertically or horizontally moving the etching nozzle on both surfaces of an erected substrate. CONSTITUTION: A nozzle frame(10) is formed along the vertical direction of a substrate(5). A hole(11) is formed on both ends of the nozzle frame. A connection frame(20) is combined with the upper and lower ends of the nozzle frame. A fixed frame(30) is combined with both ends of the connection frame. An etching nozzle(40) is installed on the nozzle frame to move up and down.