| 发明名称 |
CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD |
| 摘要 |
Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a coating chamber.
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| 申请公布号 |
CA2402040(C) |
申请公布日期 |
2011.05.10 |
| 申请号 |
CA20022402040 |
申请日期 |
2002.09.09 |
| 申请人 |
HOWMET RESEARCH CORPORATION |
发明人 |
WARNES, BRUCE M.;PURVIS, ANDREW L.;NEAR, DANIEL L. |
| 分类号 |
C23C16/44;C23C16/02;C23C16/448;C23C16/455;C23C16/54 |
主分类号 |
C23C16/44 |
| 代理机构 |
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