发明名称 A LATERAL FIELD EFFECT TRANSISTOR OF SIC, A METHOD FOR PRODUCTION THEREOF AND A USE OF SUCH A TRANSISTOR
摘要 A lateral field effected transistor of SiC for high switching frequencies comprises a source region layer (5) and a drain region layer (6) laterally spaced and highly doped n-type, an n-type channel layer (4) extending laterally and interconnecting the source region layer and the drain region layer for conducting a current between these layers in the on-state of the transistor, and a gate electrode (9) arranged to control the channel layer to be conducting or blocking through varying the potential applied to the gate electrode. A highly doped p-type base layer (12) is arranged next to the channel layer at least partially overlapping the gate electrode and being at a lateral distance to the drain region layer. The base layer is shorted to the source region layer.
申请公布号 CA2361752(C) 申请公布日期 2011.05.10
申请号 CA20002361752 申请日期 2000.02.01
申请人 ACREO AB 发明人 HARRIS, CHRISTOPHER;KONSTANTINOV, ANDREI
分类号 H01L21/335;H01L29/78;H01L;H01L21/338;H01L29/24;H01L29/772;H01L29/812 主分类号 H01L21/335
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