| 摘要 |
[Object] To provide a bias sputtering device having a self-revolving mechanism capable of reducing generation of foreign substances adhered to film formation surfaces. [Solution] In a bias sputtering device 1 provided with a substrate holder 12 having a self-revolving mechanism, the substrate holder 12 has a revolving member 21 and turning holders 23, and on the side of back surfaces of substrates 14 respectively attached to the turning holders 23, disc shaped substrate electrodes 30 having the same size as the substrates 14 are provided at positions distant from the substrates 14 by 0.5 to 10 mm.
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