| 摘要 |
PURPOSE: A dual mode coupling plasma reactor having an adjustable phase coil assembly is provided to secure the uniformity of the etch rate which is strengthened by using the strengthened RF control of ICP(Inductively coupled plasma) sources. CONSTITUTION: A plasma reactor includes a plasma source assembly(160) in the top of a process chamber(110). The assembly includes an access network, a phase controller(104), a first or internal RF coil(109), and a second or exterior RF coil. The assembly includes the first RF coil and an RF supply unit(106). The RF supply unit is combined to an RF supply structure. The phase controller adjusts the RF power in the first RF coil and the second RF coil. |
