发明名称 |
Method for generating charged particles |
摘要 |
A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer to produce charged particles and supplying such aerosol stream to the deposition chamber.
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申请公布号 |
US2011097507(A1) |
申请公布日期 |
2011.04.28 |
申请号 |
US20110985105 |
申请日期 |
2011.01.05 |
申请人 |
MSP CORPORATION |
发明人 |
DICK WILLIAM;LIU BENJAMIN Y.H. |
分类号 |
B05B5/025;B05D1/24;C23C14/48 |
主分类号 |
B05B5/025 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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