发明名称 Method for generating charged particles
摘要 A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer to produce charged particles and supplying such aerosol stream to the deposition chamber.
申请公布号 US2011097507(A1) 申请公布日期 2011.04.28
申请号 US20110985105 申请日期 2011.01.05
申请人 MSP CORPORATION 发明人 DICK WILLIAM;LIU BENJAMIN Y.H.
分类号 B05B5/025;B05D1/24;C23C14/48 主分类号 B05B5/025
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