发明名称 |
TIN OXIDE CERAMIC SPUTTERING TARGET AND METHOD OF PRODUCING IT |
摘要 |
<p>The invention describes a sputtering target comprising a ceramic body having tin oxide as a major constituent and between 0.5 and 15 wt% of at least two other oxides, one of which being antimony oxide, the target having a density of at least 90%, and preferably at least 95%, of the theoretical density (TD) and an electrical resistivity of less than 50 Ohm. cm, and the target having a planar or rotary configuration with a sputtering area of at least 10 cm2, and preferably at least 20 cm2. Also described is a process for manufacturing this sputtering target according comprising the steps of: - providing for a slurry comprising tin oxide and said at least two other oxides, - shaping of a green body from said slurry, and drying said green body, - firing of said green body at a temperature between 1050 and 1250° C, thereby obtaining a pre- shaped target, and - grinding of said pre-shaped target to its final dimensions.</p> |
申请公布号 |
WO2011044985(A1) |
申请公布日期 |
2011.04.21 |
申请号 |
WO2010EP05757 |
申请日期 |
2010.09.21 |
申请人 |
UMICORE;MEDVEDOVSKI, EUGENE;YANKOV, OLGA;SZEPESI, CHRISTOPHER, J. |
发明人 |
MEDVEDOVSKI, EUGENE;YANKOV, OLGA;SZEPESI, CHRISTOPHER, J. |
分类号 |
C04B35/453;C04B35/457;C23C14/34 |
主分类号 |
C04B35/453 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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