| 摘要 |
PURPOSE: A photo mask blank, a photo mask, and a method for manufacturing the photo mask are provided to optimize the surface illumination of a shielding layer by forming a surface reflection preventing layer on the upper side of the shielding layer. CONSTITUTION: A shielding layer(2) is made of Ta nitride of 42.4 nm and is formed on a glass substrate(1). A surface reflection preventing layer(3) is made of Ta oxide of 11 nm and is formed on the shielding layer. A shielding film(30) is comprised of the surface reflection preventing layer and the shielding layer. The shielding layer contains nitrogen of 16at%. The surface reflection preventing layer contains oxygen of 58 at%. |
