发明名称 METHOD FOR FORMING METAL OXIDE FILM, AND METAL OXIDE FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film having predetermined patterns, with less variation of surface resistivity, light transmittance, etc., and to provide such the metal oxide film. <P>SOLUTION: This method for forming a metal oxide film with predetermined patterns on a substrate comprises: a first step of applying a liquid form matter containing a metal salt on the substrate and forming a metal salt film; a second step of providing predetermined patterns to the metal salt film; and a third step of subjecting the metal salt film to thermal oxidation treatment or predetermined plasma oxidation treatment to convert it into a metal oxide film. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011079735(A) 申请公布日期 2011.04.21
申请号 JP20100247428 申请日期 2010.11.04
申请人 LINTEC CORP 发明人 NAGANAWA TOMOHITO;KONDO TAKESHI
分类号 C01B13/18;C01G9/00;C01G9/02;C01G15/00;C01G19/00;C01G23/04;H01L21/288 主分类号 C01B13/18
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