| 摘要 |
<P>PROBLEM TO BE SOLVED: To expose a new pattern all over a substrate in aligning the new pattern to a base pattern even though an amount of deviation in the location of the base pattern is different depending on a location in the substrate when exposing the new pattern on the base pattern formed on the substrate. <P>SOLUTION: The location of the base pattern in a substrate 1 is detected all over the substrate 1, and drawing data supplied to a drive circuit of a light beam irradiation apparatus 20 are created according to the location of the detected base pattern in the substrate 1. The substrate 1 is mounted to a chuck, and a chuck 10 and the light beam irradiation apparatus 20 having a spatial light modulator modulating a light beam, the drive circuit driving the spatial light modulator based on the drawing data, and an irradiation optical system irradiating the light beam modulated by the spatial light modulator are relatively moved to scan the substrate 1 by the light beam from the light beam irradiation apparatus 20, thus drawing the pattern on the substrate 1. <P>COPYRIGHT: (C)2011,JPO&INPIT |
