| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus, a method of manufacturing a device, and a device manufactured by the same. <P>SOLUTION: The lithography apparatus 1 configured to transfer a pattern from a pattern forming structure to a substrate has a substrate holder 4 configured to hold the substrate, and a substrate thermoregulator configured to adjust the temperature of the substrate before movement and during movement so that it may be made substantially in agreement with the temperature of the substrate holder 4. <P>COPYRIGHT: (C)2011,JPO&INPIT |
