| 摘要 |
A method for removing sand particles from a substrate is described. The method includes the step of treating the substrate with an acid solution comprising HxAF6, wherein A is selected from the group consisting of Si, Ge, Ti, Zr, Al, and Ga; and wherein HxAF6 is present at a concentration in the range from about 5 weight percent to about 40 weight percent.
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