发明名称 CHEMICAL APPLICATION NOZZLE AND CHEMICAL APPLICATION APPARATUS INCLUDING THE SAME
摘要 PURPOSE: A chemical applying nozzle and a chemical applying apparatus including the same are provided to improve the uniformity of a chemical applying process by suppressing the generation of a vortex phenomenon generated in the nozzle. CONSTITUTION: A chemical applying nozzle(100) includes a first body part(110) and a second body part(120). The first body part is expanded to one direction and includes one or more protrusions(112, 114) which are formed along the expanded direction of the first body. The second body part is combined with the first body part and forms a flowing channel(130). A discharging hole(132) is installed at the end part of the flowing channel. One or more grooves(122, 124) are formed on one side facing the first body part along the expanded direction of the first body part.
申请公布号 KR20110040515(A) 申请公布日期 2011.04.20
申请号 KR20090097818 申请日期 2009.10.14
申请人 SEMES CO., LTD. 发明人 HYUN, JAE IL
分类号 B05C5/02;B05B1/00;B05C1/14 主分类号 B05C5/02
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