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发明名称
Gas supply structure for substrate treatment device
摘要
申请公布号
KR101029776(B1)
申请公布日期
2011.04.19
申请号
KR20090040953
申请日期
2009.05.11
申请人
发明人
分类号
H01L21/205;H01L21/02;H01L21/3065
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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