| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an abrasive cloth that suppresses scratches so as to improve flatness of an object to be polished. <P>SOLUTION: The abrasive cloth includes a polishing layer 2 having a polishing surface P. The polishing layer 2 is formed by slicing an elastic yarn bundle in a direction intersecting with the longitudinal direction. The elastic yarn bundle is configured such that each monofilament of a polyurethane elastic yarn, formed of a spun yarn comprising a polyurethane polymer, is arranged in parallel in the longitudinal direction. In the polishing layer 2, a large number of columnar elastic materials 3 is planarly laid so as to circumscribe with each other on the peripheral surface. The elastic material 3 is formed to have an almost uniform diameter and height. The adjacent elastic materials 3 are fused at each circumscribing part so as to form each fused part Mp. In the polishing layer 2, each void Ga is formed among the elastic members 3. Each void Ga is formed so as to penetrate through in the thickness direction of the polishing layer 2, thereby allowing polished chips generated during polishing to be easily stored in the voids Ga. <P>COPYRIGHT: (C)2011,JPO&INPIT |
