发明名称 Apparatus for processing substrate
摘要 In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.
申请公布号 US7918940(B2) 申请公布日期 2011.04.05
申请号 US20060342610 申请日期 2006.01.31
申请人 SEMES CO., LTD. 发明人 AN KI-CHOUL;JOUNG YOUNG-CHUL;HA TAE-YOUNG;CHANG JUNG-WON;NOH IL-HO;LEE SEUNG-BAE
分类号 C23C16/00 主分类号 C23C16/00
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