发明名称 CHARGED PARTICLE BEAM DRAWING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a drawing apparatus that allows execution of beam drift correction not only to disturbance elements such as an air temperature and a temperature but also to elements that do not allow an operator to previously, accurately and easily know time to make the correction thereto. SOLUTION: The drawing apparatus 100 is equipped with: a drawing part 150 that draws a pattern at a desired position on a sample by deflecting an electron beam while using the electron beam; a beam drifting amount measuring part 56 that measures an amount of beam drift of the electron beam on the basis of state information indicating contents of a state generated due to a change from an another state inside the apparatus; and a deflection amount calculation part 78 that calculates an amount of deflection for deflecting the electron beam corrected by using the measured amount of beam drift of the charged particle beam. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011066054(A) 申请公布日期 2011.03.31
申请号 JP20090213184 申请日期 2009.09.15
申请人 NUFLARE TECHNOLOGY INC 发明人 NAKATA SUMITO;IIZUKA OSAMU;YAMAMURA HIKARU
分类号 H01L21/027;H01J37/305 主分类号 H01L21/027
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