| 发明名称 |
LITHOGRAPHIC DEVICE AND METHOD FOR CLEANING LITHOGRAPHIC DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic device which reduces an influence of bubbles in an immersion liquid to the imaging quality of immersion lithography, and a manufacturing method of the device. <P>SOLUTION: An immersion lithographic device is disclosed where a voltage generator applies a potential difference to an object in contact with the immersion liquid so that bubbles and/or particles in the immersion liquid are attracted or repelled from the object due to the electrokinetic potential of the surface of each bubble in the immersion liquid. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011066452(A) |
申请公布日期 |
2011.03.31 |
| 申请号 |
JP20100290462 |
申请日期 |
2010.12.27 |
| 申请人 |
ASML NETHERLANDS BV;KONINKL PHILIPS ELECTRONICS NV |
发明人 |
DUINEVELD PAULUS C;DIRKSEN PETER;KOLESNYCHENKO ALEKSEY Y;VAN SANTEN HELMAR |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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