发明名称 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To reduce writing time for writing a plurality of writing groups different in writing conditions. SOLUTION: The writing apparatus 100 includes a memory device 144 for inputting layout information of a plurality of chips on which pattern formation is to be achieved and storing the information; a writing group setting section 108 for setting, by using the layout information, a plurality of writing groups with each constituted of at least one chip and each having writing conditions differing from each other; a frame-setting section 112 for setting a frame which encloses the overall chip regions in all the writing groups; a stripe dividing section 114 for virtually dividing the frame into a plurality of stripe regions in a predetermined direction, while allowing the chips of the different writing groups to be mixed; an order-setting section 116 for setting an order of each of the plurality of regions so that a reference position of each of the regions is located in order in the predetermined direction; and a writing section 150 for writing a pattern in each of the regions onto a sample according to the order which has been set, by using an electron beam 200. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011066036(A) 申请公布日期 2011.03.31
申请号 JP20090212780 申请日期 2009.09.15
申请人 NUFLARE TECHNOLOGY INC 发明人 ANPO AKIHITO
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址