PHOTORESIST STRIPPER COMPOSITION AND PHOTORESIST PEELING METHOD EMPLOYING SAME

摘要

The present invention relates to a photoresist stripper composition. More specifically, the photoresist stripper composition according to the present invention comprises a benzimidazole-based compound and a triazole-based compound, thereby providing the advantage of outstanding photoresist peeling performance and the corrosion preventing power with respect to the photoresist lower film is also outstanding even when molybdenum (Mo) is included in the photoresist lower film.