| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
| 摘要 |
<p>Disclosed is a radiation-sensitive resin composition which contains (A) a compound represented by formula (1) and (B) an alkali-insoluble or poorly alkali-soluble resin having an acid-cleavable group, said resin becoming alkali-soluble when the acid-cleavable group is cleaved.</p> |
| 申请公布号 |
WO2011037036(A1) |
申请公布日期 |
2011.03.31 |
| 申请号 |
WO2010JP65771 |
申请日期 |
2010.09.13 |
| 申请人 |
JSR CORPORATION;SATO MITSUO;NAKAHARA KAZUO;NAKASHIMA HIROMITSU |
发明人 |
SATO MITSUO;NAKAHARA KAZUO;NAKASHIMA HIROMITSU |
| 分类号 |
G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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