发明名称 Bonding apparatus and bonding method
摘要 The present invention provides a bonding apparatus and bonding method which can prevent warping of substrates by ensuring a sufficient standing time following bonding of the substrates, using a simple and compact apparatus. Substrate carrying parts 1a are formed along the circumference of a rotating turntable 1. The respective substrate carrying parts 1a are formed so that these parts pass through substrate placement positions 11 and 12, a bonding position 13, pre-curing standing positions 14a through 14d, a curing position 15, a post-curing standing position 16 and a conveying position 17 as the turntable 1 rotates. After being bonded in the bonding position 13, the substrates move through the pre-curing standing positions 14a through 14d as a result of the rotation of the turntable 1, and are allowed to stand for a fixed period of time, so that warping is corrected.
申请公布号 US7913737(B2) 申请公布日期 2011.03.29
申请号 US20040581851 申请日期 2004.12.03
申请人 SHIBAURA MECHATRONICS CORPORATION 发明人 TAKEUCHI HACHIYA;TANABE SHOHEI;NISHIGAKI HISASHI
分类号 B29C65/00;B27G11/02;B29C65/02;B31F5/04;B32B37/00;B32B38/04;G11B7/26 主分类号 B29C65/00
代理机构 代理人
主权项
地址