发明名称 Method of forming a film on a substrate
摘要 A film-forming method of forming a film on a substrate includes performing a surface-improving treatment on the substrate, determining whether a predetermined amount of time has passed since the surface-improving treatment has been performed on the substrate, applying a film-forming solution to the substrate when it is determined that the predetermined amount of time has not passed, and repeating the surface-improving treatment on the substrate when it is determined that the predetermined amount of time has passed.
申请公布号 US7910167(B2) 申请公布日期 2011.03.22
申请号 US20050251843 申请日期 2005.10.18
申请人 SEIKO EPSON CORPORATION 发明人 KASUGA OSAMU
分类号 B05D3/06 主分类号 B05D3/06
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