发明名称 Mask, mask manufacturing method, film forming method, electro-optic device manufacturing method, and electronic apparatus
摘要 A mask includes: a base plate having an opening; a chip having an aperture pattern positioned at the opening in the base plate; a plug detachably arranged to the base plate; and a joining member joining the chip and the plug.
申请公布号 US7909932(B2) 申请公布日期 2011.03.22
申请号 US20060488835 申请日期 2006.07.18
申请人 SEIKO EPSON CORPORATION 发明人 KOEDA HIROSHI;YOTSUYA SHINICHI
分类号 C23C16/00 主分类号 C23C16/00
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