发明名称 High-Quality Hetero-Epitaxy by Using Nano-Scale Epitaxy Technology
摘要 An integrated circuit structure includes a semiconductor substrate formed of a first semiconductor material; two insulators in the semiconductor substrate; and a semiconductor region between and adjoining sidewalls of the two insulators. The semiconductor region is formed of a second semiconductor material different from the first semiconductor material, and has a width less than about 50 nm.
申请公布号 US2011062492(A1) 申请公布日期 2011.03.17
申请号 US20100831852 申请日期 2010.07.07
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 KO CHIH-HSIN;WANN CLEMENT HSINGJEN
分类号 H01L29/06 主分类号 H01L29/06
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