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发明名称
PROCESS FOR MANUFACTURING A STRUCTURE COMPRISING A GERMANIUM LAYER ON A SUBSTRATE
摘要
申请公布号
EP2294611(A1)
申请公布日期
2011.03.16
申请号
EP20090772296
申请日期
2009.06.12
申请人
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
发明人
DAVAL, NICOLAS;KONONCHUK, OLEG;GUIOT, ERIC;AULNETTE, CECILE;LALLEMENT, FABRICE;FIGUET, CHRISTOPHE;LANDRU, DIDIER
分类号
H01L21/762
主分类号
H01L21/762
代理机构
代理人
主权项
地址
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