发明名称 |
AQUEOUS COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN |
摘要 |
The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition. |
申请公布号 |
EP2294149(A1) |
申请公布日期 |
2011.03.16 |
申请号 |
EP20090766190 |
申请日期 |
2009.06.17 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
THIYAGARAJAN, MUTHIAH;CAO, YI;HONG, SUNG EUN;DAMMEL, RALPH R. |
分类号 |
C09D133/14;G03F7/039 |
主分类号 |
C09D133/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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