发明名称 PROCESS FOR PRODUCING SUBSTRATE AND COMPOSITION FOR USE IN SAME
摘要 <p>An inexpensive and easy process for producing a substrate is provided in which warpage or torsion can be more effectively avoided. Also provided is a composition for use in the process. The process for substrate production is characterized by comprising (a) a step in which a composition for film formation comprising a precursor for a polymer containing a heterocycle and an organic solvent is applied to a support and dried to form a coating film, (b) a cyclization step in which the coating film is heated at a temperature which is between the temperature lower by 60ºC than the glass transition temperature of the heterocycle-containing polymer and the temperature higher by 20ºC than the glass transition temperature of the heterocycle-containing polymer to cyclize the precursor for the heterocycle-containing polymer, a step (c) in which an element is formed on the film obtained in the cyclization step, and (d) a step in which the film having the element formed thereon is separated from the support, the heterocycle-containing polymer being at least one polymer which has a glass transition temperature in the range of 230-420ºC and is selected from a group consisting of polyimides, polybenzoxazole, polybenzothiazole, and polybenzimidazole.</p>
申请公布号 WO2011027866(A1) 申请公布日期 2011.03.10
申请号 WO2010JP65162 申请日期 2010.09.03
申请人 JSR CORPORATION;UNO, TAKAAKI;OKADA, TAKASHI 发明人 UNO, TAKAAKI;OKADA, TAKASHI
分类号 C08G73/22;C08J5/18;C08G73/08;C08G73/10;C08G73/18 主分类号 C08G73/22
代理机构 代理人
主权项
地址