发明名称 |
EXPOSURE APPARATUS, AND EXPOSURE METHOD AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of enhancing the productivity by extending the lifetime of a light source including a plurality of lamps and reducing the times of maintenance, and to provide an exposure method and a method for manufacturing a display panel substrate using the apparatus. <P>SOLUTION: The exposure apparatus includes a light source including a plurality of lamps 131-1 and 131-2, a plurality of power supplies 141-1 and 141-2 respectively supplying electric power to the plurality of lamps, a power supply controlling device 140 controlling the plurality of power supplies, and a chuck 110 to mount a substrate 101 coated with a photosensitive resin material, wherein the power controlling device 140 controls the plurality of power supplies 141-1 and 141-2 in such a manner that the electric power supplied to the plurality of lamps 131-1 and 131-2 is equalized and constant. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011048056(A) |
申请公布日期 |
2011.03.10 |
申请号 |
JP20090195260 |
申请日期 |
2009.08.26 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
NAGAMINE TOSHIYUKI;TAKENOUCHI MAKOTO |
分类号 |
G03F7/20;G02F1/1335;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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