GAS-DISCHARGING DEVICE AND SUBSTRATE-PROCESSING APPARATUS USING SAME

摘要

The present invention relates to a gas-discharging device, and to a substrate-processing apparatus implementing the gas-discharging device. The gas-discharging device according to the present invention is rotatably installed inside a chamber at a top portion of a substrate support for supporting a plurality of substrates, and comprises a plurality of gas-discharging units disposed in a circular arrangement about the central point of the substrate support so as to discharge processing gas onto the substrates. At least one of the plurality of gas-discharge units comprises: a top plate defining an inlet through which processing gas is fed; discharge plates disposed below the top plate to form a gas diffusion space together with the top plate along radial directions of the substrate support, the discharge plates defining a plurality of gas discharge holes at the bottom of the gas diffusion space in order to discharge processing gas that has been fed through the inlet and diffused in the gas diffusion space toward the substrates; and partitions installed between the top plate and the discharge plates to partition the gas diffusion space into a plurality of spaces separated from each other along the radial directions of the substrate support, wherein a plurality of inlets are provided, and the inlets are disposed at the separated spaces, respectively, to independently feed processing gases into each separated space.