| 摘要 |
<p>PURPOSE: A photo mask and a method for manufacturing semiconductor device using the same are provided to prevent the collapse of a first auxiliary pattern during the cleaning process of a photomask by connecting a first auxiliary pattern of the dot type to a second auxiliary pattern of line type. CONSTITUTION: A plurality of main patterns(210) is arranged on a semiconductor substrate. A first assistant pattern(220) of the dot type is arranged around the main pattern. The first assistant pattern of the dot type is connected to a second assist pattern(230) of the line type. The second assistant pattern connects the interval between the first assistant patterns.</p> |
