发明名称 A MONITORING SYSTEM BASED ON ETCHING OF METALS
摘要 Compositions, devices and processes related to etching of a very thin layer or fine particles of a metal are disclosed for monitoring a variety of parameters, such as time, temperature, time-temperature, thawing, freezing, microwave, humidity, ionizing radiation, sterilization and chemicals. These devices have capabilities of producing a long and sharp induction period of an irreversible visual change. The devices are composed of an indicator comprising a very thin layer of a metal and an activator, e.g., a reactant, such as water, water vapor, an acid, a base, oxidizing agent or their precursors, which is capable of reacting with the said indicator. Ink formulations composed of a metal powder and a proper activator can be used for monitoring several sterilization processes, such as sterilization with steam. When water is used as an activator, a thin layer of metals, such as that of aluminum can be used as steam sterilization or humidity indicator.
申请公布号 EP2288879(A1) 申请公布日期 2011.03.02
申请号 EP20090759402 申请日期 2009.06.04
申请人 PATEL, G 发明人 PATEL, G
分类号 G01D3/10 主分类号 G01D3/10
代理机构 代理人
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